Gas Retention Performance* of CLEANSORB Dry Bed Absorbers
Gas or Liquid Precursor Species | Chemical Formula | Outlet Concentration |
---|---|---|
Ammonia | NH3 | 20 ppm |
Arsine | AsH3 | 0.05 ppm |
Bis(cyclopentadienyl)magnesium | Mg(C5H5)2 | 3 mg/m3 (MgO) |
Bis(tert-butylamino)silane | SiH2(NHC4H9)2 | 5 ppm (SiH4) |
Boron tribromide | BBr3 | 1 ppm |
Boron trichloride | BCl3 | 1 ppm |
Boron trifluoride | BF3 | 0.35 ppm |
Bromine | Br2 | 0.1 ppm |
Carbon monoxide | CO | 30 ppm |
Chlorine | Cl2 | 0.5 ppm |
Chlorine trifluoride | ClF3 | 0.1 ppm |
Chromium hexacarbonyl | Cr(CO)6 | 2 mg/m3 (Cr) |
Diborane | B2H6 | 0.1 ppm |
Dichlorosilane | SiH2Cl2 | 2 ppm (HCl) |
Diethyl telluride | Te(C2H5)2 | 0.1 mg/m3 (Te) |
Diethylamine | C4H11N | 5 ppm |
Diethylzinc (DEZn) | Zn(C2H5)2 | 2 mg/m3 (Zn) |
Digermane | Ge2H6 | 0.2 ppm (GeH4) |
Dimethyl dimethoxy silane | Si(CH3)2(OCH3)2 | 5 ppm (SiH4) |
Dimethyl silane | SiH2(CH3)2 | 5 ppm (SiH4) |
Dimethyl telluride | Te(CH3)2 | 0.1 mg/m3 (Te) |
Dimethylamine | C2H7N | 2 ppm |
Dimethylcadmium | Cd(CH3)2 | 0.01 mg/m3 (Cd) |
Dimethylhydrazine (UDMH) | N2H2(CH3)2 | 0.01 ppm |
Dimethylzinc | Zn(CH3)2 | 2 mg/m3 (Zn) |
Disilane | Si2H6 | 5 ppm |
Ethylmethylamine | C3H9N | 2 ppm (dimethylamine) |
Fluorine | F2 | 1 ppm |
Fluorophosgene / Carbonyl fluoride | COF2 | 1 ppm (HF) |
Formaldehyde | CH2O | 0.3 ppm |
Germane | GeH4 | 0.2 ppm |
Hydrazine | N2H4 | 0.01 ppm |
Hydrogen bromide | HBr | 1 ppm |
Hydrogen chloride | HCl | 2 ppm |
Hydrogen fluoride | HF | 1 ppm |
Hydrogen selenide | H2Se | 0.015 ppm |
Hydrogen sulfide | H2S | 5 ppm |
Iodine | I2 | 0.1 ppm |
Methyltrichlorosilane | CH3SiCl3 | 2 ppm (HCl) |
Monomethyl silane | SiH3CH3 | 5 ppm (SiH4) |
Nitric oxide | NO | 25 ppm |
Nitrogen dioxide | N2O4 (NO2) | 3 ppm |
Pentakis(dimethylamino)tantalum (PDMATa) | Ta(N(CH3)2)5 | 2 ppm (dimethylamine) |
Phosgene | COCl2 | 0.02 ppm |
Phosphine | PH3 | 0.1 ppm |
Phosphorus pentachloride | PCl5 | 1 mg/m3 |
Phosphorus tribromide | PBr3 | 0.5 ppm |
Phosphorus trichloride | PCl3 | 0.5 ppm |
Phosphorus Trifluoride | PF3 | 3 ppm |
Phosphorylchloride | POCl3 | 0.2 ppm |
Ruthenocene | C10H10Ru | 20 mg/m3 (Ru) |
Silane | SiH4 | 5 ppm |
Stibine | SbH3 | 0.1 ppm |
Sulfur dioxide | SO2 | 0.5 ppm |
Tantalum ethoxide | Ta(OC2H5)5 | 20 mg/m3 (Ta2O5) |
Tantalum pentachloride | TaCl5 | 2 ppm (HCl) |
Tantalum pentafluoride | TaF5 | 1 ppm (HF) |
Tellurium hexafluoride | TeF6 | 0.02 ppm |
Tertiarybutylarsine (TBAs) | AsH2(C4H9) | 0.01 mg/m3 (As) |
Tertiarybutylphosphine (TBP) | PH2(C4H9) | 0.1 ppm (PH3) |
Tetrabromomethane | CBr4 | 1 ppm (HBr) |
Tetracarbonylnickel | Ni(CO)4 | 0.2 mg/m3 (Ni) |
Tetrachlorosilane | SiCl4 | 2 ppm (HCl) |
Tetraethyl orthosilicate | Si(OC2H5)4 | 10 ppm |
Tetrafluorosilane | SiF4 | 1 ppm (HF) |
Tetrakis(dimethylamino)hafnium (TDMAHf) | Hf(N(CH3)2)4 | 2 ppm (dimethylamine) |
Tetrakis(dimethylamino)titanium (TDMATi) | Ti(N(CH3)2)4 | 2 ppm (dimethylamine) |
Tetrakis(dimethylamino)zirconium (TDMAZr) | Zr(N(CH3)2)4 | 2 ppm (dimethylamine) |
Tetrakis(ethylmethylamino)hafnium (TEMAHf) | Hf(NC2H5CH3)4 | 2 ppm (dimethylamine) |
Tetrakis(ethylmethylamino)zirconium (TEMAZr) | Zr(NC2H5CH3)4 | 2 ppm (dimethylamine) |
Titanium tetrachloride | TiCl4 | 2 ppm (HCl) |
Titanium tetrafluoride | TiF4 | 1 ppm (HF) |
Trichlorosilane | SiHCl3 | 2 ppm (HCl) |
Triethylaluminum | Al(C2H5)3 | 2 mg/m3 (Al) |
Triethylborane | B(C2H5)3 | 0.5 mg/m3 ( H3BO3) |
Triethylgallium | Ga(C2H5)3 | 3 mg/m3 (Ga2O3) |
Triethylindium | In(C2H5)3 | 0.1 mg/m3 (In) |
Triethylphosphate | PO(C2H5O)3 | 50 mg/m3 |
Trimethyl phosphite | C3H9O3P | 2 ppm |
Trimethylaluminum (TMAl) | Al(CH3)3 | 2 mg/m3 (Al) |
Trimethylantimony | Sb(CH3)3 | 0.5 mg/m3 (Sb) |
Trimethylboron | B(CH3)3 | 0.1 ppm |
Trimethylgallium (TMGa) | Ga(CH3)3 | 3 mg/m3 (Ga2O3) |
Trimethylindium (TMIn) | In(CH3)3 | 0.1 mg/m3 (In) |
Trisilane | Si3H8 | 5 ppm (SiH4) |
Tungsten hexacarbonyl | W(CO)6 | 5 mg/m3 (W) |
Tungsten hexafluoride | WF6 | 1 ppm (HF) |
Xenon difluoride | XeF2 | 1 ppm (F2) |
* Systems specifications are based on review and approval of the individual process application